On the permittivity of titanium dioxide
Development and Characterization of Titanium Dioxide Ceramic Substrates with High Dielectric Permittivities
Novel high-κ dielectrics for next-generation electronic devices screened by automated ab initio calculations | NPG Asia Materials
Synthesis, Characterization and Properties of Zirconium Oxide (ZrO2)-Doped Titanium Oxide (TiO2) Thin Films Obtained via Sol-Gel Process | IntechOpen
ZrO2-TiO2 thin films: a new material system for mid-infrared integrated photonics
Synthesis, Characterization and Properties of Zirconium Oxide (ZrO2)-Doped Titanium Oxide (TiO2) Thin Films Obtained via Sol-Gel Process | IntechOpen
Current-voltage curves for TiO2/ZrO2/Si thin films. The inverted... | Download Scientific Diagram
Materials | Free Full-Text | Development and Characterization of Titanium Dioxide Ceramic Substrates with High Dielectric Permittivities | HTML
ZrO2-TiO2 thin films: a new material system for mid-infrared integrated photonics
Synthesis, Characterization and Properties of Zirconium Oxide (ZrO2)-Doped Titanium Oxide (TiO2) Thin Films Obtained via Sol-Gel Process | IntechOpen
On the permittivity of titanium dioxide | Scientific Reports
Colossal permittivity, electrical conductivity and ferromagnetic properties of pure TiO2: Mono and binary doping - ScienceDirect
Energy gap versus relative permittivity for various insulators and... | Download Scientific Diagram
Interfacial charge-transfer process across ZrO2-TiO2 heterojunction and its impact on photocatalytic activity - ScienceDirect
Cross-sectional TEM images of TiO2/ZrO2/Si thin films. (a) As-deposited... | Download Scientific Diagram
Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium a
ZrO2-TiO2 thin films: a new material system for mid-infrared integrated photonics
High dielectric constant oxides
Structural, dielectric and impedance studies on high-k ZrO2–TiO2 nanocomposite | SpringerLink
Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium a
Impact of ZrO2 Dielectrics Thickness on Electrical Performance of TiO2 Thin Film Transistors with Sub-2 V Operation | ACS Applied Electronic Materials
Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium a
Tunable dielectric properties of TiO2 thin film based MOS systems for application in microelectronics - ScienceDirect
